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    A Study of Trimethylsilane (3MS) and Tetramethylsilane (4MS) Based α-SiCN:H/α-SiCO:H Diffusion Barrier Films

    A Study of Trimethylsilane (3MS) and Tetramethylsilane (4MS) Based α-SiCN:H/α-SiCO:H Diffusion Barrier Films 由 Chen, Sheng-Wen, Wang, Yu-Sheng, Hu, Shao-Yu, Lee, Wen-Hsi, Chi, Chieh-Cheng, Wang, Ying-Lang

    出版 2012
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